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Ion mobility spectroscopy and infrared spectroscopy

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LSLM-500 step lithography machine

LSLM-500 stepper lithography machine is a device used to manufacture integrated circuits (ICs). It can form millions of micro circuit components on the surface of tiny silicon chips, which is an important part of complex processes.

Product details
Product Features and Applications

Purpose: Step by step lithography can reduce the scale of mask pattern and transfer it to the substrate surface to be exposed.
Main specifications: the mask pattern can be reduced by 5 times in the same proportion for exposure; Linewidth: up to 500nm; A variety of models of positive and negative photoresist can be used together;
Applicable chip size: the sample size cannot be greater than 6 inches.
Splashable materials: metal like Al, Cu, Gr, Co, Fe, Ni, Pt, Ag, Ti, Ta; Alloy NiFe, CoFe, CoFeB, NiMn, FeMn, TbFeCo; Oxide MgO, etc.
Size: 170 cm * 130 cm * 180 cm

Product features:
High accuracy;
Desktop type, small size, built-in computer;
Customizable hardware and software to meet the needs of the industry;
Elasticity is applicable to various substrates and shapes;
Application field:
Small and medium scale integrated circuit;
Semiconductor components;
Development and production of SAW devices;
Detailed parameters:

Chip size	4 ", 6", 8 ", 12"
Exposure light source	UV-LED
Light source wavelength used	365nm
Resolving power	Develop 500nm, 400nm and 300nm successively
Focus accuracy	150nm
Scale Multiplier	1:0.5
Exposure mode	Step projection type
Feature size uniformity（CDU）	±10%

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